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There will be more manufacturers of photoresist for EUV lithography. But this market was monopolized by Japan
Semiconductor lithography using ultra-hard ultraviolet radiation has been mastered by only two chip manufacturers, but there is no doubt that it is the future. And like any future, it opens the door for pioneers to establish themselves in a new market. In particular, materials for technical processes using EUV range scanners will be produced by two Japanese companies, among which will be the well-known Fujifilm company.
Nikkei today announced that Fujifilm Holdings and Sumitomo Chemical will begin supplying materials for next-generation chips in 2021, which could help reduce the size of chips for smartphones and other devices and make them more energy efficient. We are talking about the supply of photoresist – a photosensitive material that plays a dominant role in the etching of silicon crystals.
Japanese companies have long seized the photoresist supply. For example, today the supply of photoresist for the operation of EUV range scanners is mainly carried out by two Japanese companies – JSR and Shin-Etsu Chemical, which control about 90% of this market. This virtually monopoly position even allowed the Japanese authorities to threaten South Korea with sanctions, which shook up the chip market just over a year ago. Fortunately, then everything settled down, and the appearance of two other suppliers of photoresist for EUV lithography would further defuse the situation, although they will also be Japanese.
Fujifilm, the source continues, is investing 4.5 billion yen ($ 42.6 million) to equip a manufacturing facility in Shizuoka Prefecture, southwest of Tokyo, to begin mass production of the photoresist next year. According to company representatives, its photoresist leaves behind a minimal amount of residual material on silicon, which significantly reduces the likelihood of defects.
Sumitomo Chemical to complete the full range of photoresist capacities (from design to production) at its Osaka plant by early FY2022. But she, as a well-known manufacturer of photoresist for 193-nm scanners, has already signed contracts for future products in advance. True, he does not disclose with whom yet. It is possible that we are talking about TSMC. By that time, the issue of photoresist production for 3-nm technical processes will be relevant, for which modern photoresist is not suitable for many reasons. Projection in the ultra-hard ultraviolet range requires its own photoresist and the thinner the technical process, the higher the requirements for it.